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| Management number | 231878894 | Release Date | 2026/06/18 | List Price | $35.75 | Model Number | 231878894 | ||
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A comprehensive guide to TSV and other enabling technologies for 3D integrationWritten by an expert with more than 30 years of experience in the electronics industry, Through-Silicon Vias for 3D Integration provides cutting-edge information on TSV, wafer thinning, thin-wafer handling, microbumping and assembly, and thermal management technologies. Applications to highperformance, high-density, low-power-consumption, wide-bandwidth, and small-form-factor electronic products are discussed.This book offers a timely summary of progress in all aspects of this fascinating field for professionals active in 3D integration research and development, those who wish to master 3D integration problem-solving methods, and anyone in need of a low-power, wide-bandwidth design and high-yield manufacturing process for interconnect systems.Coverage includes:Nanotechnology and 3D integration for the semiconductor industryTSV etching, dielectric-, barrier-, and seed-layer deposition, Cu plating, CMP, and Cu revealingTSVs: mechanical, thermal, and electrical behaviorsThin-wafer strength measurementWafer thinning and thin-wafer handlingMicrobumping, assembly, and reliabilityMicrobump electromigrationTransient liquid-phase bonding: C2C, C2W, and W2W2.5D IC integration with interposers3D IC integration with interposersThermal management of 3D IC integration3D IC packaging Read more
| ASIN | B008SOCEMW |
|---|---|
| XRay | Not Enabled |
| ISBN13 | 978-0071785150 |
| Edition | 1st |
| Language | English |
| File size | 18.0 MB |
| Page Flip | Enabled |
| Publisher | McGraw Hill |
| Word Wise | Not Enabled |
| Print length | 721 pages |
| Accessibility | Learn more |
| Screen Reader | Supported |
| Publication date | August 5, 2012 |
| Enhanced typesetting | Enabled |
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